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Kanak B. Agarwal
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2010 – 2019
- 2013
- [j1]Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta:
Layout Decomposition and Legalization for Double-Patterning Technology. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 32(2): 202-215 (2013) - 2012
- [c9]Kanak B. Agarwal, Shayak Banerjee:
Design driven patterning optimizations for low K1 lithography. ICICDT 2012: 1-4 - [c8]Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars W. Liebmann, Puneet Gupta:
O(n) layout-coloring for multiple-patterning lithography and conflict-removal using compaction. ICICDT 2012: 1-4 - [c7]Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif:
Design-aware lithography. ISPD 2012: 3-8 - 2011
- [c6]Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif:
Electrically-driven retargeting for nanoscale layouts. CICC 2011: 1-4 - [c5]Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta:
A framework for double patterning-enabled design. ICCAD 2011: 14-20 - [c4]Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif, James A. Culp, Lars Liebmann, Michael Orshansky:
Coupling timing objectives with optical proximity correction for improved timing yield. ISQED 2011: 97-102 - 2010
- [c3]Shayak Banerjee, Kanak B. Agarwal, Michael Orshansky:
Ground rule slack aware tolerance-driven optical proximity correction for local metal interconnects. CICC 2010: 1-4 - [c2]Shayak Banerjee, Kanak B. Agarwal, Chin Ngai Sze, Sani R. Nassif, Michael Orshansky:
A methodology for propagating design tolerances to shape tolerances for use in manufacturing. DATE 2010: 1273-1278 - [c1]Shayak Banerjee, Kanak B. Agarwal, Michael Orshansky:
SMATO: Simultaneous mask and target optimization for improving lithographic process window. ICCAD 2010: 100-106
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