BibTeX record journals/mj/TsangLKSLWLTE04

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@article{DBLP:journals/mj/TsangLKSLWLTE04,
  author       = {C. F. Tsang and
                  C. Y. Li and
                  A. Krishnamoorthy and
                  Y. J. Su and
                  H. Y. Li and
                  L. Y. Wong and
                  W. H. Li and
                  L. J. Tang and
                  K. Y. Ee},
  title        = {Impact of barrier deposition process on electrical and reliability
                  performance of Cu/CVD low k SiOCH metallization},
  journal      = {Microelectron. J.},
  volume       = {35},
  number       = {9},
  pages        = {693--700},
  year         = {2004},
  url          = {https://doi.org/10.1016/j.mejo.2004.06.019},
  doi          = {10.1016/J.MEJO.2004.06.019},
  timestamp    = {Sat, 22 Feb 2020 19:33:21 +0100},
  biburl       = {https://dblp.org/rec/journals/mj/TsangLKSLWLTE04.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}