BibTeX record journals/tcad/YuXGL0AP15

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@article{DBLP:journals/tcad/YuXGL0AP15,
  author       = {Bei Yu and
                  Xiaoqing Xu and
                  Jhih{-}Rong Gao and
                  Yibo Lin and
                  Zhuo Li and
                  Charles J. Alpert and
                  David Z. Pan},
  title        = {Methodology for Standard Cell Compliance and Detailed Placement for
                  Triple Patterning Lithography},
  journal      = {{IEEE} Trans. Comput. Aided Des. Integr. Circuits Syst.},
  volume       = {34},
  number       = {5},
  pages        = {726--739},
  year         = {2015},
  url          = {https://doi.org/10.1109/TCAD.2015.2401571},
  doi          = {10.1109/TCAD.2015.2401571},
  timestamp    = {Thu, 24 Sep 2020 11:27:41 +0200},
  biburl       = {https://dblp.org/rec/journals/tcad/YuXGL0AP15.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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