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J. K. Efavi

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2000 – 2009

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2007
[j2]
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  - journals/mr/AbermannESLOB07
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  - https://dblp.org/rec/journals/mr/AbermannESLOB07
Stephan Abermann, J. K. Efavi, G. Sjöblom, Max Christian Lemme, Jörgen Olsson, Emmerich Bertagnolli:
Impact of Al-, Ni-, TiN-, and Mo-metal gates on MOCVD-grown HfO₂ and ZrO₂ high-kappa dielectrics. Microelectron. Reliab. 47(4-5): 536-539 (2007)
2005
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Max Christian Lemme, J. K. Efavi, H. D. B. Gottlob, Thomas Mollenhauer, Thorsten Wahlbrink, Heinrich Kurz:
Comparison of metal gate electrodes on MOCVD HfO₂. Microelectron. Reliab. 45(5-6): 953-956 (2005)

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