BibTeX records: Daniel N. Zhang

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@inproceedings{DBLP:conf/isqed/MelvinZSW06,
  author    = {Lawrence S. Melvin III and
               Daniel N. Zhang and
               Kirk J. Strozewski and
               Skye Wolfer},
  title     = {The Use of the Manufacturing Sensitivity Model Forms to Comprehend
               Layout Manufacturing Robustness For Use During Device Design},
  booktitle = {7th International Symposium on Quality of Electronic Design {(ISQED}
               2006), 27-29 March 2006, San Jose, CA, {USA}},
  pages     = {485--490},
  publisher = {{IEEE} Computer Society},
  year      = {2006},
  url       = {https://doi.org/10.1109/ISQED.2006.135},
  doi       = {10.1109/ISQED.2006.135},
  timestamp = {Wed, 16 Oct 2019 14:14:55 +0200},
  biburl    = {https://dblp.org/rec/conf/isqed/MelvinZSW06.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}
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