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F. Mecarini

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2005
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A. Pecora, Luca Maiolo, A. Bonfiglietti, M. Cuscunà, F. Mecarini, Luigi Mariucci, Guglielmo Fortunato, N. D. Young:
Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing. Microelectron. Reliab. 45(5-6): 879-882 (2005)

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