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Alexander L. Shluger
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2020 – today
- 2023
- [c9]Andrea Padovani, Paolo La Torraca, Jack Strand, Alexander L. Shluger, Valerio Milo, Luca Larcher:
Towards a Universal Model of Dielectric Breakdown. IRPS 2023: 1-8 - 2022
- [c8]Milan Pesic, Andrea Padovani, Tommaso Rollo, Bastien Beltrando, Jack Strand
, Parnika Agrawal, Alexander L. Shluger, Luca Larcher:
Variability and disturb sources in ferroelectric 3D NANDs and comparison to Charge-Trap equivalents. IMW 2022: 1-4 - [c7]James Farmer
, Dmitry Veksler, E. Tang, Gennadi Bersuker, David Z. Gao
, Al-Moatasem El-Sayed, Thomas Durrant
, Alexander L. Shluger, Thomas Rueckes, Lee Cleveland, Harry Luan, Rahul Sen:
Combining measurements and modeling/simulations analysis to assess carbon nanotube memory cell characteristics. IRPS 2022: 36-1 - [c6]Anthony J. Kenyon
, Adnan Mehonic, Wing H. Ng, Longfei Zhao, Horatio Cox, Mark Buckwell, Kamal Patel, Andrew P. Knights, Daniel J. Mannion, Alexander L. Shluger:
Defining the performance of SiOx ReRAM by engineering oxide microstructure. MOCAST 2022: 1-4 - [c5]Idan Shem Tov, Anwesha Mukherjee, Joseph Hayon, Laura Hargreaves, Alexander L. Shluger, Yossi Rosenwaks:
Hydrogen Induced Dipole Layer in Pd-SiO2 Based Gas Sensors. SAS 2022: 1-6 - 2021
- [c4]James Farmer
, William Whitehead, Andrew Hall, Dmitry Veksler, Gennadi Bersuker, David Z. Gao
, Al-Moatasem El-Sayed, Thomas Durrant
, Alexander L. Shluger, Thomas Rueckes, Lee Cleveland, Harry Luan, Rahul Sen:
Mitigating switching variability in carbon nanotube memristors. IRPS 2021: 1-4 - [c3]Milan Pesic, Bastien Beltrando, Andrea Padovani
, Shruba Gangopadhyay, Muthukumar Kaliappan, Michael Haverty, Marco A. Villena, Enrico Piccinini, Matteo Bertocchi, Tony Chiang, Luca Larcher, Jack Strand
, Alexander L. Shluger:
Variability sources and reliability of 3D - FeFETs. IRPS 2021: 1-7
2010 – 2019
- 2018
- [j3]Wolfgang Goes, Yannick Wimmer, Al-Moatasem El-Sayed
, Gerhard Rzepa, Markus Jech, Alexander L. Shluger, Tibor Grasser
:
Identification of oxide defects in semiconductor devices: A systematic approach linking DFT to rate equations and experimental evidence. Microelectron. Reliab. 87: 286-320 (2018) - [c2]David Z. Gao, Jack Strand
, Al-Moatasem El-Sayed, Alexander L. Shluger, Andrea Padovani, Luca Larcher:
Role of electron and hole trapping in the degradation and breakdown of SiO2 and HfO2 films. IRPS 2018: 5 - 2015
- [j2]David Z. Gao
, Filippo Federici Canova, Matthew B. Watkins
, Alexander L. Shluger:
Efficient parametrization of complex molecule-surface force fields. J. Comput. Chem. 36(16): 1187-1195 (2015) - [c1]Tibor Grasser
, M. Wahl, Wolfgang Goes, Yannick Wimmer, Al-Moatasem El-Sayed, Alexander L. Shluger, Ben Kaczer:
On the volatility of oxide defects: Activation, deactivation, and transformation. IRPS 2015: 5 - 2010
- [j1]Maria L. Sushko
, Peter V. Sushko
, Igor V. Abarenkov
, Alexander L. Shluger:
QM/MM method for metal-organic interfaces. J. Comput. Chem. 31(16): 2955-2966 (2010)
Coauthor Index
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