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Anthony R. Forte

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1990 – 1999

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1997
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Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek:
Lithography at a wavelength of 193 nm. IBM J. Res. Dev. 41(1&2): 49-56 (1997)

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