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Y. G. Fedorenko

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2000 – 2009

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2005
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Y. G. Fedorenko, L. Truong, V. V. Afanasev, A. Stesmans, Z. Zhang, Stephen A. Campbell:
Impact of nitrogen incorporation on interface states in (100)Si/HfO₂. Microelectron. Reliab. 45(5-6): 802-805 (2005)
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L. Truong, Y. G. Fedorenko, V. V. Afanasev, A. Stesmans:
Admittance spectroscopy of traps at the interfaces of (100)Si with Al₂O₃, ZrO₂, and HfO₂. Microelectron. Reliab. 45(5-6): 823-826 (2005)

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