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ORCIDEddy De Backer
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2010 – 2019
- 2010
[j6]R. Charavel, Jaume Roig, S. Mouhoubi, P. Gassot, Filip Bauwens, Piet Vanmeerbeek, B. Desoete, Peter Moens, Eddy De Backer:
Next generation of Deep Trench Isolation for Smart Power technologies with 120 V high-voltage devices. Microelectron. Reliab. 50(9-11): 1758-1762 (2010)
2000 – 2009
- 2008
- [j5]Jan Ackaert, R. Charavel, K. Dhondt, B. Vlachakis, Luc De Schepper, M. Millecam, E. Vandevelde, P. Bogaert, A. Iline, Eddy De Backer, Alexandru Vlad
, Jean-Pierre Raskin:
MIMC reliability and electrical behavior defined by a physical layer property of the dielectric. Microelectron. Reliab. 48(8-9): 1553-1556 (2008) - 2004
- [j4]Zhichun Wang, Jan Ackaert, Cora Salm, Fred G. Kuper, Eddy De Backer:
Plasma Charging Damage Reduction in IC Processing by A Self-balancing Interconnect. Microelectron. Reliab. 44(9-11): 1503-1507 (2004) - 2003
- [j3]Jan Ackaert, Klara Bessemans, Eddy De Backer:
Charging induced damage by photoconduction through thick inter metal dielectrics. Microelectron. Reliab. 43(9-11): 1525-1529 (2003) - 2001
- [j2]Peter Coppens, Guido Vanhorebeek, Eddy De Backer:
Correlation between predicted cause of SRAM failures and in-line defect data. Microelectron. Reliab. 41(1): 53-57 (2001) - [j1]Jan Ackaert, Zhichun Wang, Eddy De Backer, P. Colson, Peter Coppens:
Non Contact Surface Potential Measurements for Charging Reduction During Manufacturing of Metal-Insulator-Metal Capacitors. Microelectron. Reliab. 41(9-10): 1403-1407 (2001)
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