BibTeX record conf/dac/YangLMYY18

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@inproceedings{DBLP:conf/dac/YangLMYY18,
  author       = {Haoyu Yang and
                  Shuhe Li and
                  Yuzhe Ma and
                  Bei Yu and
                  Evangeline F. Y. Young},
  title        = {{GAN-OPC:} mask optimization with lithography-guided generative adversarial
                  nets},
  booktitle    = {Proceedings of the 55th Annual Design Automation Conference, {DAC}
                  2018, San Francisco, CA, USA, June 24-29, 2018},
  pages        = {131:1--131:6},
  publisher    = {{ACM}},
  year         = {2018},
  url          = {https://doi.org/10.1145/3195970.3196056},
  doi          = {10.1145/3195970.3196056},
  timestamp    = {Wed, 16 Oct 2019 14:14:54 +0200},
  biburl       = {https://dblp.org/rec/conf/dac/YangLMYY18.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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