BibTeX record conf/iccad/JoshiABS10

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@inproceedings{DBLP:conf/iccad/JoshiABS10,
  author       = {Vivek Joshi and
                  Kanak Agarwal and
                  David T. Blaauw and
                  Dennis Sylvester},
  editor       = {Louis Scheffer and
                  Joel R. Phillips and
                  Alan J. Hu},
  title        = {Analysis and optimization of {SRAM} robustness for double patterning
                  lithography},
  booktitle    = {2010 International Conference on Computer-Aided Design, {ICCAD} 2010,
                  San Jose, CA, USA, November 7-11, 2010},
  pages        = {25--31},
  publisher    = {{IEEE}},
  year         = {2010},
  url          = {https://doi.org/10.1109/ICCAD.2010.5654105},
  doi          = {10.1109/ICCAD.2010.5654105},
  timestamp    = {Fri, 24 Mar 2023 00:01:52 +0100},
  biburl       = {https://dblp.org/rec/conf/iccad/JoshiABS10.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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