BibTeX record journals/ibmrd/WuNVLH02

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@article{DBLP:journals/ibmrd/WuNVLH02,
  author       = {Ernest Y. Wu and
                  Edward J. Nowak and
                  Alex Vayshenker and
                  Wing L. Lai and
                  David L. Harmon},
  title        = {{CMOS} scaling beyond the 100-nm node with silicon-dioxide-based gate
                  dielectrics},
  journal      = {{IBM} J. Res. Dev.},
  volume       = {46},
  number       = {2-3},
  pages        = {287--298},
  year         = {2002},
  url          = {https://doi.org/10.1147/rd.462.0287},
  doi          = {10.1147/RD.462.0287},
  timestamp    = {Fri, 13 Mar 2020 10:54:10 +0100},
  biburl       = {https://dblp.org/rec/journals/ibmrd/WuNVLH02.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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