"Modeling, control, and optimization: Critical technologies in ..."

Kameshwar Poolla (2008)

> Home

Details and statistics

DOI: 10.1109/CCA.2008.4629560

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-23

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/IEEEcca/Poolla08
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/IEEEcca/Poolla08
Kameshwar Poolla:
Modeling, control, and optimization: Critical technologies in semiconductor manufacturing. CCA 2008: 20

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.