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"Model-based control of rapid thermal processing for semiconductor wafers."

Jon L. Ebert et al. (2004)

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DOI: 10.23919/ACC.2004.1383921

access: closed

type: Conference or Workshop Paper

metadata version: 2022-11-24

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  - conf/amcc/EbertRPLGKE04
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  - https://dblp.org/rec/conf/amcc/EbertRPLGKE04
Jon L. Ebert, Dick de Roover, La Moyne L. Porter, V. A. Lisiewicz, Sarbajit Ghosal, Robert L. Kosut, Abbas Emami-Naeini:
Model-based control of rapid thermal processing for semiconductor wafers. ACC 2004: 3910-3921

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