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"Adaptive modeling and H∞ control for photolithography ..."

Wei Kang, Ziqiang John Mao (2004)

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DOI: 10.23919/ACC.2004.1386769

access: closed

type: Conference or Workshop Paper

metadata version: 2022-12-06

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Wei Kang, Ziqiang John Mao:
Adaptive modeling and H_∞ control for photolithography manufacturing process. ACC 2004: 1392-1393

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