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"Channel Stress Engineering Through Source/Drain Recess Optimization and ..."

Dawei Wang et al. (2021)

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DOI: 10.1109/ASICON52560.2021.9620270

access: closed

type: Conference or Workshop Paper

metadata version: 2021-12-06

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  dblp key:
  - conf/asicon/WangLSCYWXZ21
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  - https://dblp.org/rec/conf/asicon/WangLSCYWXZ21
Dawei Wang, Tao Liu, Xin Sun, Kun Chen, Jingwen Yang, Chunlei Wu, Min Xu, David Wei Zhang:
Channel Stress Engineering Through Source/Drain Recess Optimization and Its Process Variation Study for 5 nm-node FinFETs. ASICON 2021: 1-4

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