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"Challenge: variability characterization and modeling for 65- to 90-nm ..."

Hiroo Masuda et al. (2005)

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DOI: 10.1109/CICC.2005.1568738

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-17

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Hiroo Masuda, Shin-ichi Ohkawa, Atsushi Kurokawa, Masakazu Aoki:
Challenge: variability characterization and modeling for 65- to 90-nm processes. CICC 2005: 593-599

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