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"Lithography options for the 32nm half pitch node and beyond."
Kurt Ronse et al. (2008)
- Kurt Ronse, Philippe Jansen, Roel Gronheid, Eric Hendrickx, Mireille Maenhoudt, Mieke Goethals, Geert Vandenberghe:
Lithography options for the 32nm half pitch node and beyond. CICC 2008: 371-378
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