"Ultrathin Gate Dielectric Enabled by Nanofog Aluminum Oxide on Monolayer MoS2."

Jung-Soo Ko et al. (2023)

> Home

Details and statistics

DOI: 10.1109/ESSDERC59256.2023.10268527

access: closed

type: Conference or Workshop Paper

metadata version: 2025-03-03

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/essderc/KoZLJBKKBPS23
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/essderc/KoZLJBKKBPS23
Jung-Soo Ko, Zichen Zhang, Sol Lee, Marc Jaikissoon, Robert K. A. Bennett, Kwanpyo Kim, Andrew C. Kummel, Prabhakar Bandaru, Eric Pop, Krishna C. Saraswat:
Ultrathin Gate Dielectric Enabled by Nanofog Aluminum Oxide on Monolayer MoS2. ESSDERC 2023: 1-4

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.