"Mechanical behavior of photopolymer for additive manufacturing applications."

Fan-Chun Hsieh et al. (2017)

> Home

Details and statistics

DOI: 10.1109/I2MTC.2017.7969726

access: closed

type: Conference or Workshop Paper

metadata version: 2019-09-26

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/i2mtc/HsiehLPYCH17
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/i2mtc/HsiehLPYCH17
Fan-Chun Hsieh, Ping-Hung Lin, Hsu-Pin Pan, Chih-Sheng Yu, Chun-Ming Chang, Yi-Chiuen Hu:
Mechanical behavior of photopolymer for additive manufacturing applications. I2MTC 2017: 1-4

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.