"An Investigation of ESD-Enhancement by the Drain-side Embedded SCR Area ..."

Zhi-Wei Liu et al. (2022)

> Home

Details and statistics

DOI: 10.1109/ICCE-TAIWAN55306.2022.9869111

access: closed

type: Conference or Workshop Paper

metadata version: 2022-09-09

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/icce-tw/LiuCLMC22
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/icce-tw/LiuCLMC22
Zhi-Wei Liu, Shen-Li Chen, Jhong-Yi Lai, Xing-Chen Mai, Yu-Jie Chung:
An Investigation of ESD-Enhancement by the Drain-side Embedded SCR Area Modulation for HV pLDMOSs. ICCE-TW 2022: 73-74

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.