BibTeX record conf/icicdt/TriyosoMHTKKKMH17

• > Home > conf/icicdt/TriyosoMHTKKKMH17

@inproceedings{DBLP:conf/icicdt/TriyosoMHTKKKMH17,
  author    = {D. H. Triyoso and
               G. R. Mulfinger and
               K. Hempel and
               H. Tao and
               F. Koehler and
               L. Kang and
               A. Kumar and
               T. McArdle and
               J. Holt and
               A. L. Child and
               S. Straub and
               F. Ludwig and
               Z. Chen and
               J. Kluth and
               Rick Carter},
  title     = {Characterization of atomic layer deposited low-k spacer for {FDSOI}
               high-k metal gate transistor},
  booktitle = {2017 {IEEE} International Conference on {IC} Design and Technology,
               {ICICDT} 2017, Austin, TX, USA, May 23-25, 2017},
  pages     = {1--4},
  publisher = {{IEEE}},
  year      = {2017},
  url       = {https://doi.org/10.1109/ICICDT.2017.7993500},
  doi       = {10.1109/ICICDT.2017.7993500},
  timestamp = {Wed, 16 Oct 2019 14:14:54 +0200},
  biburl    = {https://dblp.org/rec/conf/icicdt/TriyosoMHTKKKMH17.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}