"Modeling the Plasma Enhanced Chemical Vapor Deposition Process Using ..."

Seung Soo Han, Gary S. May (1994)

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DOI: 10.1109/TAI.1994.346407

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-24

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Seung Soo Han, Gary S. May:
Modeling the Plasma Enhanced Chemical Vapor Deposition Process Using Neural Networks and Genetic Algorithms. ICTAI 1994: 760-763

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