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"Distributed Correction of Proximity Effect in Electron Beam Lithography on ..."

Noppachai Anupongpaibool, Soo-Young Lee (2004)

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DOI: 10.1109/IPDPS.2004.1302907

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-24

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  persistent URL:
  - https://dblp.org/rec/conf/ipps/AnupongpaiboolL04
Noppachai Anupongpaibool, Soo-Young Lee:
Distributed Correction of Proximity Effect in Electron Beam Lithography on a Heterogeneous Cluster. IPDPS 2004

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