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"Comprehensive device and product level reliability studies on advanced ..."
D. S. Huang et al. (2018)
- D. S. Huang, J. H. Lee, Y. S. Tsai, Y. F. Wang, Y. S. Huang, C. K. Lin, Ryan Lu, Jun He:
Comprehensive device and product level reliability studies on advanced CMOS technologies featuring 7nm high-k metal gate FinFET transistors. IRPS 2018: 6
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