"Electrical and reliability performance of atomic layer deposition HfO2 ..."

Kai-Chieh Kao et al. (2015)

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DOI: 10.1109/IRPS.2015.7112773

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-21

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Kai-Chieh Kao, Chi-Jia Huang, Chang-Sian Wu, Yi-Lung Cheng:
Electrical and reliability performance of atomic layer deposition HfO2 capping layer on porous low dielectric constant materials. IRPS 2015: 1

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