"Oxygen vacancy traps in Hi-K/Metal gate technologies and their potential ..."

Chandrasekharan Kothandaraman et al. (2015)

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DOI: 10.1109/IRPS.2015.7112816

access: closed

type: Conference or Workshop Paper

metadata version: 2024-08-08

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Chandrasekharan Kothandaraman, X. Chen, Dan Moy, Dallas Lea, Sami Rosenblatt, Faraz Khan, Derek Leu, Toshiaki Kirihata, D. Ioannou, Giuseppe La Rosa, Jeffrey B. Johnson, Norman Robson, Subramanian S. Iyer:
Oxygen vacancy traps in Hi-K/Metal gate technologies and their potential for embedded memory applications. IRPS 2015: 2

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