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"Hot carrier degradation, TDDB, and 1/f noise in Poly-Si Tri-gate nanowire ..."

Yoko Yoshimura, Kensuke Ota, Masumi Saitoh (2018)

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DOI: 10.1109/IRPS.2018.8353606

access: closed

type: Conference or Workshop Paper

metadata version: 2019-01-22

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  - conf/irps/YoshimuraOS18
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Yoko Yoshimura, Kensuke Ota, Masumi Saitoh:
Hot carrier degradation, TDDB, and 1/f noise in Poly-Si Tri-gate nanowire transistor. IRPS 2018: 5

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