BibTeX record conf/isqed/MelvinZSW06

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@inproceedings{DBLP:conf/isqed/MelvinZSW06,
  author    = {Lawrence S. Melvin III and
               Daniel N. Zhang and
               Kirk J. Strozewski and
               Skye Wolfer},
  title     = {The Use of the Manufacturing Sensitivity Model Forms to Comprehend
               Layout Manufacturing Robustness For Use During Device Design},
  booktitle = {{ISQED}},
  pages     = {485--490},
  publisher = {{IEEE} Computer Society},
  year      = {2006}
}
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