"Identifying Lithography Weak-Points of Standard Cells with Partial Pattern ..."

Yongfu Li et al. (2018)

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DOI: 10.1109/ISVLSI.2018.00082

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-24

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Yongfu Li, I-Lun Tseng, Zhao Chuan Lee, Valerio Perez, Vikas Tripathi, Yoong Seang Jonathan Ong:
Identifying Lithography Weak-Points of Standard Cells with Partial Pattern Matching. ISVLSI 2018: 417-422

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