"Gate Stack Optimization Toward Disturb-Free Operation of Ferroelectric HSO ..."

Konrad Seidel et al. (2019)

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DOI: 10.1109/NVMTS47818.2019.8986166

access: closed

type: Conference or Workshop Paper

metadata version: 2022-08-04

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Konrad Seidel, Kati Biedermann, Jan Van Houdt, Tarek Ali, Raik Hoffmann, Kati Kühnel, Malte Czernohorsky, Matthias Rudolph, Björn Pätzold, Philipp Steinke, K. Zimmermann:
Gate Stack Optimization Toward Disturb-Free Operation of Ferroelectric HSO based FeFET for NAND Applications. NVMTS 2019: 1-4

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