"Excursion Prevention Strategyto Increase Chip Performance by Photomask Tuning."

Ofir Sharoni et al. (2020)

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DOI: 10.1109/VLSI-DAT49148.2020.9196276

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type: Conference or Workshop Paper

metadata version: 2020-09-29

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Ofir Sharoni, Yael Sufrin, Avi Cohen, Rolf Seltmann, Aravind Narayana, Thomas Thamm:
Excursion Prevention Strategyto Increase Chip Performance by Photomask Tuning. VLSI-DAT 2020: 1

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