"A process-scalable RF transmitter using 90nm and 65nm Si CMOS."

Atsushi Shirane et al. (2013)

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DOI: 10.1109/VLDI-DAT.2013.6533878

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-26

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Atsushi Shirane, Hiroyuki Ito, Noboru Ishihara, Kazuya Masu:
A process-scalable RF transmitter using 90nm and 65nm Si CMOS. VLSI-DAT 2013: 1-4

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