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"Characterization, Modeling and Extraction of Cu Wire Resistance for 65 nm ..."

Ning Lu et al. (2007)

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DOI: 10.1109/CICC.2007.4405680

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-17

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Ning Lu, Matthew Angyal, Gerald Matusiewicz, Vincent J. McGahay, Theodorus E. Standaert:
Characterization, Modeling and Extraction of Cu Wire Resistance for 65 nm Technology. CICC 2007: 57-60

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