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ORCID"Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection."
Imen Chakroun et al. (2020)
- Imen Chakroun, Thomas J. Ashby, Sayantan Das, Sandip Halder, Roel Wuyts, Wilfried Verachtert:
Using Unsupervised Machine Learning for Plasma Etching Endpoint Detection. ICPRAM 2020: 273-279
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