"Industrial Monitoring of Residue Deposition in Semiconductor Process ..."

Minho Jeon et al. (2025)

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DOI: 10.1109/ACCESS.2024.3523596

access: open

type: Journal Article

metadata version: 2025-01-25

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Minho Jeon, Anil Kumar Khambampati, Jong Hyun Song, Keun Joong Yoon, Kyung Youn Kim:
Industrial Monitoring of Residue Deposition in Semiconductor Process Exhaust Pipelines Using Electrical Capacitance Measurements. IEEE Access 13: 1445-1457 (2025)

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