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"Effect of ALD Processes on Physical and Electrical Properties of ..."
Honggyun Kim et al. (2022)
- Honggyun Kim, Vijay D. Chavan
, Jamal Aziz
, Byoungsu Ko, Jae-Sung Lee
, Junsuk Rho
, Tukaram D. Dongale
, Kyeong-Keun Choi
, Deok-Kee Kim
:
Effect of ALD Processes on Physical and Electrical Properties of HfO2 Dielectrics for the Surface Passivation of a CMOS Image Sensor Application. IEEE Access 10: 68724-68730 (2022)
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