"Explainable prediction of deposited film thickness in IC fabrication with ..."

Yumeng Shi et al. (2024)

> Home

Details and statistics

DOI: 10.1007/S10489-023-05121-2

access: closed

type: Journal Article

metadata version: 2024-07-18

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/apin/ShiCLC24
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/apin/ShiCLC24
Yumeng Shi, Yu Cai, Shunyuan Lou, Yining Chen:
Explainable prediction of deposited film thickness in IC fabrication with CatBoost and SHapley Additive exPlanations (SHAP) models. Appl. Intell. 54(11-12): 246-263 (2024)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.