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"Use of neural network to in situ conditioning of semiconductor plasma ..."

Byungwhan Kim, Daehyun Kim (2012)

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DOI: 10.1016/J.ASOC.2011.10.007

access: closed

type: Journal Article

metadata version: 2017-05-26

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Byungwhan Kim, Daehyun Kim:
Use of neural network to in situ conditioning of semiconductor plasma processing equipment. Appl. Soft Comput. 12(2): 826-831 (2012)

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