"Control of photoresist film thickness: Iterative feedback tuning approach."

Arthur Tay et al. (2006)

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DOI: 10.1016/J.COMPCHEMENG.2005.10.004

access: closed

type: Journal Article

metadata version: 2020-10-26

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Arthur Tay, Weng Khuen Ho, Jiewen Deng, Boon Keng Lok:
Control of photoresist film thickness: Iterative feedback tuning approach. Comput. Chem. Eng. 30(3): 572-579 (2006)

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