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"Novel devices and process for 32 nm CMOS technology and beyond."

Yangyuan Wang et al. (2008)

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DOI: 10.1007/S11432-008-0071-8

access: closed

type: Journal Article

metadata version: 2020-05-18

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  dblp key:
  - journals/chinaf/WangZLH08
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  - https://dblp.org/rec/journals/chinaf/WangZLH08
Yangyuan Wang, Xing Zhang, Xiaoyan Liu, Ru Huang:
Novel devices and process for 32 nm CMOS technology and beyond. Sci. China Ser. F Inf. Sci. 51(6): 743-755 (2008)

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