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"Bridging defects resistance in the metal layer of a CMOS process."

Rosa Rodríguez-Montañés, E. M. J. G. Bruls, Joan Figueras (1996)

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DOI: 10.1007/BF00136074

access: closed

type: Journal Article

metadata version: 2020-09-11

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  dblp key:
  - journals/et/Rodriguez-MontanesBF96
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  - https://dblp.org/rec/journals/et/Rodriguez-MontanesBF96
Rosa Rodríguez-Montañés, E. M. J. G. Bruls, Joan Figueras:
Bridging defects resistance in the metal layer of a CMOS process. J. Electron. Test. 8(1): 35-46 (1996)

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