"Development and application of a new tool for lithographic mask ..."

Russell A. Budd et al. (1997)

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DOI: 10.1147/RD.411.0119

access: closed

type: Journal Article

metadata version: 2020-03-13

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Russell A. Budd, Derek B. Dove, John L. Staples, Ronald M. Martino, Richard A. Ferguson, J. Tracy Weed:
Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS. IBM J. Res. Dev. 41(1&2): 119-130 (1997)

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