"Plasma-assisted chemical vapor deposition of dielectric thin films for ..."

Donna R. Cote et al. (1999)

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DOI: 10.1147/RD.431.0005

access: closed

type: Journal Article

metadata version: 2020-03-13

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Donna R. Cote, Son Van Nguyen, Anthony K. Stamper, Douglas S. Armbrust, Dirk Tobben, Richard A. Conti, Gill Yong Lee:
Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits. IBM J. Res. Dev. 43(1): 5-38 (1999)

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