"Investigation of bilayer HfNx gate insulator utilizing ECR ..."

Nithi Atthi, Shun'ichiro Ohmi (2016)

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DOI: 10.1587/ELEX.13.20160054

access: open

type: Journal Article

metadata version: 2021-02-12

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Nithi Atthi, Shun'ichiro Ohmi:
Investigation of bilayer HfN_x gate insulator utilizing ECR plasma sputtering. IEICE Electron. Express 13(10): 20160054 (2016)

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