"Impact of the double-patterning technique on the LER-induced threshold ..."

Seulki Park, Ju Han Lee, Changhwan Shin (2015)

> Home

Details and statistics

DOI: 10.1587/ELEX.12.20150349

access: open

type: Journal Article

metadata version: 2021-02-12

- view
  - electronic edition via DOI (open access)
  authority control:
- export record
  dblp key:
  - journals/ieiceee/ParkLS15
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/ieiceee/ParkLS15
Seulki Park, Ju Han Lee, Changhwan Shin:
Impact of the double-patterning technique on the LER-induced threshold voltage variation in symmetric tunnel field-effect transistor. IEICE Electron. Express 12(12): 20150349 (2015)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.