"Low Temperature Hetero-Epitaxy of Ferromagnetic Silicide on Ge Substrates ..."

Yu-ichiro Ando et al. (2008)

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DOI: 10.1093/IETELE/E91-C.5.708

access: closed

type: Journal Article

metadata version: 2020-04-11

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Yu-ichiro Ando, Koji Ueda, Mamoru Kumano, Taizoh Sadoh, Kazumasa Narumi, Yoshihito Maeda, Masanobu Miyao:
Low Temperature Hetero-Epitaxy of Ferromagnetic Silicide on Ge Substrates for Spin-Transistor Application. IEICE Trans. Electron. 91-C(5): 708-711 (2008)

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