"Study of 30-nm Double-Gate MOSFET with Halo Implantation Technology Using ..."

Tetsuo Endoh, Yuto Momma (2007)

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DOI: 10.1093/IETELE/E90-C.5.1000

access: closed

type: Journal Article

metadata version: 2020-04-11

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Tetsuo Endoh, Yuto Momma:
Study of 30-nm Double-Gate MOSFET with Halo Implantation Technology Using a Two-Dimensional Device Simulator. IEICE Trans. Electron. 90-C(5): 1000-1005 (2007)

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