"An Advanced 405-nm Laser Diode Crystallization Method of a-Si Film for ..."

Kiyoshi Morimoto et al. (2011)

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DOI: 10.1587/TRANSELE.E94.C.1733

access: closed

type: Journal Article

metadata version: 2020-04-11

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  - https://dblp.org/rec/journals/ieicet/MorimotoSYYML11
Kiyoshi Morimoto, Nobuyasu Suzuki, Kazuhiko Yamanaka, Masaaki Yuri, Janet Milliez, Xinbing Liu:
An Advanced 405-nm Laser Diode Crystallization Method of a-Si Film for Fabricating Microcrystalline-Si TFTs. IEICE Trans. Electron. 94-C(11): 1733-1738 (2011)

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